This is a very basic lithography simulation and pixel-based OPC tool.
The simulation uses an analytical model similar to A. Poonawala, P. Milanfar, “A Pixel-Based Regularization Approach to Inverse Lithography”,Microelectronic Engineering, 84 (2007) pp. 2837–2852.
The OPC just does a simulated annealing algorithm to minimize error between the target mask and the simulated mask. It does not convert the pixel-based mask into a manufacturable mask.
Mask, Aerial Image, Contours
OPC'ed Mask (high cost!), OPC Aerial Image, OPC Contours
